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and Ao Liu, Guoxia Liu, Huihui Zhu Byoungchul Shin Elvira Fortunato Rodrigo Martins Fukai Shan. "Eco-friendly, solution-processed In-W-O thin films and their applications in low-voltage, high-performance transistors." Journal of Materials Chemistry C. 4 (2016): 4478-4484. AbstractWebsite

In this study, amorphous indium-tungsten oxide (IWO) semiconductor thin films were prepared by an eco-friendly spin-coating process using ethanol and water as solvents. The electrical properties of IWO thin-film transistors (TFTs), together with the structural and morphological characteristics of IWO thin films, were systematically investigated as functions of tungsten concentration and annealing temperature. The optimized IWO channel layer was then integrated on an aqueous aluminum oxide (AlOx) gate dielectric. It is observed that the solution-processed IWO/AlOx TFT presents high stability and improved characteristics, such as an on/off current ratio of 5 × 107, a field-effect mobility of 15.3 cm2 V-1 s-1, a small subthreshold slope of 68 mV dec-1, and a threshold voltage shift of 0.15 V under bias stress for 2 h. The IWO/AlOx TFT could be operated at a low voltage of 2 V, which was 15 times lower than that of conventional SiO2-based devices. The solution-processed IWO thin films synthesized in a green route would be promising candidates for large-area and high-performance low-cost devices. © The Royal Society of Chemistry 2016.

Águas, H.a, Pereira Ferreira Ramos Viana Andreu Vilarinho Fortunato Martins L. a I. a. "Effect of an interfacial oxide layer in the annealing behaviour of Au/a-Si:H MIS photodiodes." Journal of Non-Crystalline Solids. 338-340 (2004): 810-813. AbstractWebsite

This work presents a study on the effect of an interfacial silicon oxide layer placed between Au and a-Si:H MIS (metal-insulator-semiconductor) photodiodes in their performances, by stopping the Au diffusion towards the a-Si:H. The results show that the Au diffuses very easily to the oxide free a-Si:H surface, even at room temperature, degrading the photodiode performance. On the other hand, the MIS photodiodes with the interfacial oxide show an improvement of their characteristics after annealing, function of its thickness, and degree of film's compactness. This effect is associated with the presence of oxide of thicknesses ≥5 Å at the Au/a-Si:H interface that prevents the Au diffusion and improves the photodiode characteristics, which does not happen when the interfacial oxide is absent. © 2004 Elsevier B.V. All rights reserved.

Aguas, H.a, Pereira Ferreira Ramos Viana Andreu Vilarinho Fortunato Martins L. a I. a. "Effect of annealing on gold rectifying contacts in amorphous silicon." Materials Science Forum. 455-456 (2004): 96-99. AbstractWebsite

This work presents a study performed on several Au contacts deposited by evaporation on oxide free and oxidised (5-20Å of oxide) a-Si:H surfaces. The characterisation of the films was performed on as deposited, aged and annealed at 150°C structures. SIMS and RBS measurements show that the Au diffuses very easily on oxide free a-Si:H surfaces, even at room temperature, resulting in the formation of an oxide at the device surface that acquires a blue colour instead of the gold colour of the contacts. This was also visible in the SEM pictures of the cross section of the structures produced and on the changes of the surface morphology observed by AFM measurements. On the other hand, when the Au is deposited on oxidised a-Si:H surfaces, the results show that the oxide prevents the Au from diffusing and the nature of the contact is preserved. That is, better rectifying and stability performances are obtained in MIS like structures than in Schottky structures.

Elangovan, E., Marques Pimentel Martins Fortunato A. A. R. "Effect of annealing on molybdenum doped indium oxide thin films RF sputtered at room temperature." Vacuum. 82 (2008): 1489-1494. AbstractWebsite

Thin films of molybdenum doped indium oxide (IMO) were deposited on glass at room temperature using an in-built three-source RF magnetron sputtering. The films were studied as a function of oxygen volume percentage (O2 vol. %; ranging from 0.0 to 17.5%) in the sputtering chamber. The as-deposited amorphous films were crystallized on post-annealing. The as-deposited films are low conducting and Hall coefficients were undetectable; whereas post-annealed films possess fairly high conductivity. The lowest transmittance (11.96% at 600 nm) observed from the films deposited without oxygen increased to a maximum of 88.01% (3.5 O2 vol. %); whereas this transmittance was decreased with the increasing O2 vol. % to as low as 81.04% (15.6 O2 vol. %); a maximum of 89.80% was obtained from the films annealed at 500 °C in open air (3.5 O2 vol. %). The optical band gap of 3.80 eV obtained from the films deposited without oxygen increased with increasing O2 vol. % to as high as 3.91 eV (17.5 O2 vol. %). A maximum of 3.92 eV was obtained from the films annealed at 300 °C in N2:H2 gas atmosphere (17.5 O2 vol. %). © 2008 Elsevier Ltd. All rights reserved.

Wang, J.a, Elamurugu Sallet Jomard Lusson Rego Barquinha Gonçalves Martins Fortunato E. a V. b. "Effect of annealing on the properties of N-doped ZnO films deposited by RF magnetron sputtering." Applied Surface Science. 254 (2008): 7178-7182. AbstractWebsite

N-doped ZnO films were deposited by RF magnetron sputtering in N2/Ar gas mixture and were post-annealed at different temperatures (Ta) ranging from 400 to 800 °C in O2 gas at atmospheric pressure. The as-deposited and post-annealed films were characterized by their structural (XRD), compositional (SIMS, XPS), optical (UV-vis-NIR spectrometry), electrical (Hall measurements), and optoelectronic properties (PL spectra). The XRD results authenticate the improvement of crystallinity following post-annealing. The weak intensity of the (0 0 2) reflection obtained for the as-deposited N-doped ZnO films was increased with the increasing Ta to become the preferred orientation at higher Ta (800 °C). The amount of N-concentration and the chemical states of N element in ZnO films were changed with the Ta, especially above 400 °C. The average visible transmittance (400-800 nm) of the as-deposited films (26%) was increased with the increasing Ta to reach a maximum of 75% at 600 °C but then decreased. In the PL spectra, A0X emission at 3.321 eV was observed for Ta = 400 °C besides the main D0X emission. The intensity of the A0X emission was decreased with the increasing Ta whereas D0X emission became sharper and more optical emission centers were observed when Ta is increased above 400 °C. © 2008 Elsevier B.V. All rights reserved.

Elangovan, E., Martins Fortunato R. E. "Effect of annealing on the properties of RF sputtered indium molybdenum oxide thin films." Journal of Non-Crystalline Solids. 354 (2008): 2831-2838. AbstractWebsite

Indium molybdenum oxide thin films radio-frequency sputtered at room temperature on glass were studied as a function of oxygen volume percentage. The as-deposited films were post-annealed in the temperature range of 300-500 °C in oxidizing (open air) and reducing (N2:H2 gas) atmospheres for 1 h. The as-deposited amorphous films become crystalline on post-annealing irrespective of the annealing conditions. In most cases, the (2 2 2) diffraction line is emerged as the high intensive peak. The films annealed at ≥400 °C in N2:H2 show a carrier concentration >1020 cm-3. The better electrical properties are obtained for the films post-annealed at 300 °C. The optical transmittance of the as-deposited films varies between 10% and 85% depending on the deposition and annealing conditions. Atomic force microscope analysis reveal that the films annealed at 300 °C are composed of closely packed crystallites (size of which varies between 5 nm and 150 nm) whose size varies noticeably when the annealing temperature is raised to 400 °C. On the other hand, the surface of the films annealed at 500 °C becomes rougher, with the RMS roughness varying between 2.00 nm and 16.97 nm. The surface of the films deposited in the presence of oxygen shows metal like features when annealed at ≥400 °C in N2:H2 that is attributed to the segregation of indium. Further, the segregation of In is substantiated from the scanning electron microscope analysis of these samples. © 2008 Elsevier B.V. All rights reserved.

Barquinha, P.a, Gonçalves Pereira Martins Fortunato G. a L. b. "Effect of annealing temperature on the properties of IZO films and IZO based transparent TFTs." Thin Solid Films. 515 (2007): 8450-8454. AbstractWebsite

This work shows the effect of the annealing temperature and atmosphere on the properties of r.f. magnetron sputtered indium-zinc oxide (IZO) thin-films of two types: one a conductive film (as-deposited, room temperature) that exhibits a resistivity of 3.5 × 10- 4 Ω cm; the other, a semiconductor film with a resistivity ∼ 102 Ω cm. The annealing temperatures were changed between 125 and 500 °C. Crystallization of the more conductive films was already noticeable at temperatures around 400 °C. Three different annealing atmospheres were used - vacuum, air and oxygen. For the conductive films, only the oxygen atmosphere was critical, leading to an increase of the electrical resistivity of more than one order of magnitude, for temperatures of 250 °C and above. Concerning the semiconductor films, both temperature and atmosphere had a strong effect on the film's properties, and the resistivity of the annealed films was always considerably smaller than the as-deposited films. Finally, some results of the application of these films to transparent TFTs are shown. © 2007 Elsevier B.V. All rights reserved.

Elangovan, E., Martins Fortunato R. E. "Effect of base and oxygen partial pressures on the electrical and optical properties of indium molybdenum oxide thin films." Thin Solid Films. 515 (2007): 8549-8552. AbstractWebsite

Indium molybdenum oxide thin films were RF sputtered at room temperature on glass substrates with a reference base pressure of 7.5 × 10- 4 Pa. The electrical and optical properties of the films were studied as a function of oxygen partial pressures (OPP) ranging from 1.5 × 10- 3 Pa to 3.5 × 10- 3 Pa. The obtained data show that the bulk resistivity of the films increased by about 4 orders of magnitude (from 7.9 × 10- 3 to 7.6 × 101 Ω-cm) when the OPP increased from 1.5 × 10-3 to 3.5 × 10- 3 Pa, and the carrier concentration decreased by about 4 orders (from 1.77 × 1020 to 2.31 × 1016 cm- 3). On the other hand, the average visible transmittance of 30.54% of the films (brown colour; OPP = 1.5 × 10- 3 Pa) was increased with increasing OPP to a maximum of 80.47% (OPP = 3.5 × 10- 3 Pa). The optical band gap calculated from the absorption edge of the transmittance spectra ranges from 3.77 to 3.88 eV. Further, the optical and electrical properties of the films differ from those deposited at similar conditions but with a base pressure lower than 7.5 × 10- 4 Pa. © 2007 Elsevier B.V. All rights reserved.

Barquinha, P., Pereira Goņalves Martins Fortunato L. G. R. "The effect of deposition conditions and annealing on the performance of high-mobility GIZO TFTs." Electrochemical and Solid-State Letters. 11 (2008): H248-H251. AbstractWebsite

The influence of oxygen content, radio-frequency (rf) sputtering power, and postdeposition annealing on the electrical properties of gallium-indium-zinc oxide (GIZO) thin-film transistors (TFTs) is analyzed. Little to no oxygen content in the sputtering chamber is crucial to obtain high-performance devices, even before annealing. In contrast, a high oxygen content and rf power lead, respectively, to unstable/poor performing and depletion mode TFTs before annealing, and mainly for these "nonideal" conditions, annealing proves to be effective to improve device performance/stability and to decrease the performance discrepancy among TFTs processed under different oxygen and rf power conditions. Best TFTs present a field-effect mobility of 46 cm2 / V s, subthreshold swing of 0.26 V/dec, threshold voltage of 0.70 V, and an on/off ratio 108 - 109. These results are a consequence of the optimized processing and of the usage of proper GIZO target composition, 1:2:1 mol. © 2008 The Electrochemical Society.

Nunes, P., Fortunato Vilarinho Martins E. P. R. "Effect of deposition conditions upon gas sensitivity of zinc oxide thin films deposited by spray pyrolysis." Solid State Phenomena. 80-81 (2001): 151-154. AbstractWebsite

In this work we present the results of a study concerning the role of the properties of zinc oxide thin films deposited by spray pyrolysis on its sensitivity to methane or ethane. It was found that using highly resistive thin layers leads to an increase in the film sensitivity. The variation of the operating temperature of the film leads to a significant change in the sensitivity of the sensor and the ideal operating temperature dependence of the gas used. The sensitivity of the ZnO thin films changes linear with the increase of the gas concentration. However these films seem to be more appropriated for the detection of methane than for ethane since the value of sensitivity obtained are higher and its variation with the gas concentration more pronounced. After the annealing treatment performed the films sensitivity decreases.

Nunes, P.a, Fortunato Tonello Braz Fernandes Vilarinho Martins E. a P. a. "Effect of different dopant elements on the properties of ZnO thin films." Vacuum. 64 (2002): 281-285. AbstractWebsite

In this work we studied the influence of the dopant elements and concentration on the properties of ZnO thin film deposited by spray pyrolysis. The results show that the doping affects the thin films properties mainly the electrical ones, function of dopant concentration and nature. The most important changes were observed for films doped with 1at% of indium which exhibit a resistivity of 1.9 × 10-1 Ωcm associated with a transmitance of 90%. After the annealing treatment, the resistivity of the film decreases to 5.9 × 10-3 Ωcm without significative changes in the optical properties. The films were also used to produce amorphous silicon solar cells where the best results were obtained for ZnO:In. © 2002 Elsevier Science Ltd. All rights reserved.

Nunes, P.a, Fortunato Vilarinho Martins E. a P. b. "Effect of different dopants on the properties of ZnO thin films." International Journal of Inorganic Materials. 3 (2001): 1211-1213. AbstractWebsite

The influence of doping on the properties of zinc oxide thin films deposited by spray pyrolysis has been studied. The results show that the doping affects the properties of the films, mainly the electrical ones, function of its concentration and nature. The most significative improvement were observed for films doped with 1 at.% of indium exhibiting a resistivity of 1.9 × 10-1 Ω m associated to a transmittance of 86%, characteristics required for applications on the optoelectronic devices. © 2001 Elsevier Science Ltd. All rights reserved.

Fortunato, Elvira, Carvalho Carlos Bicho Ana Martins Rodrigo N. "Effect of different TCO interfaces on the performances presented by hydrogenated amorphous silicon p-i-n solar cells." Conference Record of the IEEE Photovoltaic Specialists Conference. Vol. 1. 1994. 646-649. Abstract

In this paper we report results concerning the effect of the TCO interface on hydrogenated amorphous silicon (a-Si:H) p-i-n homojunction solar cells. Its correlation with dark current density-voltage (J-V) characteristics and spectral response, before and after while light-soaking degradation, is analysed. From this study, we conclude that the properties and stability of these devices are not only influenced by the a-Si:H film properties, but also by the properties of the transparent conductive electrode and its interface with the a-Si:H layer.

O'Brien, S.a, Çopuroglu Tassie Nolan Hamilton Povey Pereira Martins Fortunato Pemble M. a P. b. "The effect of dopants on the morphology, microstructure and electrical properties of transparent zinc oxide films prepared by the sol-gel method." Thin Solid Films. 520 (2011): 1174-1177. AbstractWebsite

The influence of doping on the morphology, physical and electrical properties of zinc oxide produced by the sol-gel method was examined. Undoped zinc oxide was observed to form relatively porous films. Addition of an Al dopant influenced the sheet resistance, but did not result in a change in morphology, examined by atomic force microscopy when compared to undoped films. In the case of electrical measurements, undoped ZnO films were extremely resistive. A minimum dopant concentration of 2 at.%. Al was required to produce materials which were more conductive, as observed by sheet resistance measurements, which were shown to vary with annealing temperature. The versatile nature of sol-gel processing was demonstrated by selective ink-jet deposition of sol-gel droplets which were annealed to form oxide materials. © 2011 Elsevier B.V. All rights reserved.

Martins, R.M., Siqueira MacHado Freitas S. M. O. "The effect of homogenization method on the properties of carbamazepine microparticles prepared by spray congealing." Journal of Microencapsulation. 30 (2013): 692-700. AbstractWebsite

The aim of this study was to investigate the influence of ultrasound and high-shear mixing on the properties of microparticles obtained by spray congealing. Dispersions containing 10% carbamazepine and 90% carrier Gelucire® 50/13 (w/w) were prepared using magnetic stirring, high-shear mixing, or ultrasound. Each preparation was made using hot-melt mixing spray congealing to obtain the microparticles. All microparticles presented a spherical shape with high encapsulation efficiency (>99%). High-shear mixing and ultrasound promoted a decrease in the size of microparticles (D90) to 62.8 ± 4.1 μm and 64.9 ± 3.3 μm, respectively, while magnetic stirring produced microparticles with a size of 84.1 ± 1.4 μm. The use of ultrasound led to microparticles with increased moisture content as identified through sorption isotherm studies. In addition, rheograms showed distinct rheological behaviour among different dispersion preparations. Therefore, the technique used to prepare dispersions for spray congealing can affect specific characteristics of the microparticles and should be controlled during the preparation. © 2013 Informa UK Ltd. All rights reserved.

Parthiban, S.a b, Elangovan Ramamurthi Kanjilal Asokan Martins Fortunato E. b K. a. "Effect of Li3+ heavy ion irradiation on the Mo doped In2O3 thin films prepared by spray pyrolysis technique." Journal of Physics D: Applied Physics. 44 (2011). AbstractWebsite

The high visible-near infrared transparent and high carrier mobility (μ) Mo doped (0.5 at%) indium oxide (IMO) films were deposited by the spray pyrolysis technique. The deposited films were irradiated by 50MeV Li 3+ ions with different fluences of 1×1011, 1×1012 and 1×1013 ions cm-2. X-ray diffraction analysis confirmed the cubic bixbyite structure of indium oxide. A fascinating feature is that the ion irradiation process has introduced a fraction of the molybdenum oxide phase. The μ of as-deposited IMO films is decreased from ̃122.4 to 93.3 cm2 V-1 s-1, following the ion irradiation. The theoretically calculated μ and carrier density values were correlated with those measured experimentally. The transport mechanism has been analysed based on the ionized and neutral impurity scattering centres. The average transmittance (400-2500 nm) of the as-deposited IMO films is decreased from 83% to 60% following irradiation. © 2011 IOP Publishing Ltd.

Wang, J.a, Elamurugu Li Jiao Zhao Martins Fortunato E. b H. a. "Effect of N and P codoping on ZnO properties." Advanced Materials Research. 645 (2013): 64-67. AbstractWebsite

Nitrogen and Phosphorus co-doped (N+P)- zinc oxide (ZnO) films were RF sputtered on corning glass substrates at 350 °C and comparatively studied with undoped, N-, and P- doped ZnO. X-ray diffraction spectra confirmed that the ZnO structure with a preferred orientation along <002> direction. Scanning electron microscope analysis showed different microstructure for the N+P co-doping, and thus probably confirming the co-existence of both the dopants. X-ray photoelectron spectroscopy spectra revealed that the chemical composition in N+P co-doped ZnO are different from that found in undoped, N-, and P- doped ZnO. The atomic ratio of N and P in N+P co-doped ZnO is higher than that in single N or P doped ZnO. One broad ZnO emission peak around 420 nm is observed in photoluminescence spectra. The relative intensity of the strongest peak obtained from co-doped ZnO films is about twice than the P- doped and thrice than the pure and N- doped films. © (2013) Trans Tech Publications, Switzerland.

Gonçalves, G.a, Fortunato Martins Martins E. a J. b. "Effect of oxidant/monomer ratio on the electrical properties of polypyrrole in tantalum capacitors." Materials Science Forum. 514-516 (2006): 43-47. AbstractWebsite

In this work, the relation between oxidant/monomer ratio and the electrical conductivity of polypyrrole was studied using different ratios. We achieved a maximum value for electrical conductivity of 7.5 S/cm for a ratio of 2:1. We also developed a chemical dip-coating process to produce the cathode layer in tantalum capacitors. We obtained capacitances of about 80 μF after 8 cycles using the sequence Monomer/Oxidant.

Figueiredo, V.a, Elangovan Gonçalves Barquinha Pereira Franco Alves Martins Fortunato E. a G. a. "Effect of post-annealing on the properties of copper oxide thin films obtained from the oxidation of evaporated metallic copper." Applied Surface Science. 254 (2008): 3949-3954. AbstractWebsite

Thin films of copper oxide were obtained through thermal oxidation (100-450 °C) of evaporated metallic copper (Cu) films on glass substrates. The X-ray diffraction (XRD) studies confirmed the cubic Cu phase of the as-deposited films. The films annealed at 100 °C showed mixed Cu-Cu2O phase, whereas those annealed between 200 and 300 °C showed a single cubic Cu2O phase. A single monoclinic CuO phase was obtained from the films annealed between 350 and 450 °C. The positive sign of the Hall coefficient confirmed the p-type conductivity in the films with Cu2O phase. However, a relatively poor crystallinity of these films limited the p-type characteristics. The films with Cu and CuO phases show n-type conductivity. The surface of the as-deposited is smooth (RMS roughness of 1.47 nm) and comprised of uniformly distributed grains (AFM and SEM analysis). The post-annealing is found to be effective on the distribution of grains and their sizes. The poor transmittance of the as-deposited films (<1%) is increased to a maximum of ∼80% (800 nm) on annealing at 200 °C. The direct allowed band gap is varied between 2.03 and 3.02 eV. © 2008 Elsevier B.V. All rights reserved.

Pimentel, A.a, Rodrigues Duarte Nunes Costa Monteiro Martins Fortunato J. b P. a. "Effect of solvents on ZnO nanostructures synthesized by solvothermal method assisted by microwave radiation: a photocatalytic study." Journal of Materials Science. 50 (2015). AbstractWebsite

Abstract: The present work reports the synthesis of zinc oxide (ZnO) nanoparticles with hexagonal wurtzite structure considering a solvothermal method assisted by microwave radiation and using different solvents: water (H2O), 2-ethoxyethanol (ET) and ethylene glycol (EG). The structural characterization of the produced ZnO nanoparticles has been accessed by scanning electron microscopy, X-ray diffraction, room-temperature photoluminescence and Raman spectroscopies. Different morphologies have been obtained with the solvents tested. Both H2O and ET resulted in rods with high aspect ratio, while EG leads to flower-like structure. The UV absorption spectra showed peaks with an orange shift for synthesis with H2O and ET and blue shift for synthesis with EG. The different synthesized nanostructures were tested for photocatalyst applications, revealing that the ZnO nanoparticles produced with ET degrade faster the molecule used as model dye pollutant, i.e. methylene blue. Graphical Abstract: [Figure not available: see fulltext.] © 2015 Springer Science+Business Media New York

Dias, A.G., Guimarães Martins L. R. "The effect of static electric and magnetic fields on the optical properties of amorphous hydrogenated silicon films produced by r.f. glow discharge." Thin Solid Films. 89 (1982): 307-313. AbstractWebsite

The aim of the present work was to study the optical properties of amorphous hydrogenated silicon films produced by capacitive and inductive r.f. glow discharge in a 3%SiH4-Ar gas mixture. The effect of the application of static electric and magnetic fields during the film formation on the photoconductivity, photoactivation energy, recombination mechanisms and optical gap was thoroughly investigated. Films prepared in a capacitively or inductively coupled discharge show bias-dependent photoconductivities, which reach about 10-4 Ω-1 cm-1 for an inductive discharge with a negative bias and about 10-5 Ω-1 cm-1 for a capacitive discharge with a positive bias. The optical gap is of the order of 1.55 eV for capacitive films and is bias dependent for inductive films (1.45-1.85 eV). A superimposed magnetic field (of about 1 kG) increases the photoconductivity by one order of magnitude for both deposition methods. The optical gap is field dependent for inductive films (1.6-1.8 eV) and is about 1.6 eV for capacitive films. The main recombination mechanism at a moderate photon flux (less than 1014 cm-2 s-1) is monomolecular for all deposition conditions. The photoactivation energy lies between 0.1 and 0.2 eV for capacitive films and is about 0.1 eV for inductive films. It was also found that, by using suitable crossed electric and magnetic fields, it was possible to control the density and nature of the defect states in the films. These are correlated with the type of hydrogenated silicon species and with the amount of hydrogen incorporated into the films, which markedly influence the film properties. © 1982.

Sekhar, M.C.a, Uthanna Martins Chandra Elangovan S. a R. b. "The effect of Substrate temperature on physical and electrical properties of DC magnetron sputtered (Ta 2O 5) 0.85(TiO 2) 0.15 films." IOP Conference Series: Materials Science and Engineering. Vol. 34. 2012. Abstract

Thin films of (Ta 2O 5) 0.85(TiO 2) 0.15 were deposited on quartz and p-Si substrates by DC reactive magnetron sputtering at different substrate temperatures (T s) in the range 303 - 873 K. The films deposited at 303 0K were in the amorphous and it transformed to crystalline at substrate temperatures ≥ 573 0K. The crystallite size was increased from 50 nm to 72 nm with the increase of substrate temperature. The surface morphology was significantly influenced with the substrate temperature. After deposition of the (Ta 2O 5) 0.85(TiO 2) 0.15 films on Si, aluminium (Al) electrode was deposited to fabricate metal/oxide/semiconductor (MOS) capacitors with a configuration of Al/(Ta 2O 5) 0.85(TiO 2) 0.15/Si. A low leakage current of 7.7 × 10 -5 A/cm 2 was obtained from the films deposited at 303 K. The leakage current was decreased to 9.3 × 10 -8 A/cm 2 with the increase of substrate temperature owing to structural changes. The conduction mechanism of the Al/(Ta 2O 5) 0.85(TiO 2) 0.15/Si capacitors was analyzed and compared with mechanisms of Poole-Frenkel and Schottky emissions. The optical band gap (E g) was decreased from 4.45 eV to 4.38 eV with the increase in substrate temperature. © Published under licence by IOP Publishing Ltd.

Golshahi, S.a, Rozati Botelho Do Rego Wang Elangovan Martins Fortunato S. M. b A. "Effect of substrate temperature on the properties of pyrolytically deposited nitrogen-doped zinc oxide thin films." Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 178 (2013): 103-108. AbstractWebsite

The effect of substrate temperature (Ts) on the properties of pyrolytically deposited nitrogen (N) doped zinc oxide (ZnO) thin films was investigated. The Ts was varied from 300 °C to 500 °C, with a step of 50 °C. The positive sign of Hall coefficient confirmed the p-type conductivity in the films deposited at 450 °C and 500 °C. X-ray diffraction studies confirmed the ZnO structure with a dominant peak from (1 0 0) crystal plane, irrespective of the variation in Ts. The presence of N in the ZnO structure was evidenced through X-ray photoelectron spectroscopy (XPS) analysis. The obtained high N concentration reveals that the 450 °C is the optimal Ts. Atomic force microscope (AFM) analysis showed that the surface roughness was increased with the increasing Ts until 400 °C but then decreased. It is found that the transmittance of the deposited films is increased with the increasing Ts. The optical band gap calculated from the absorption edge showed that the films deposited with T s of 300 °C and 350 °C possess higher values than those deposited at higher Ts. © 2012 Elsevier B.V.

Dirani, E.A.T., Pereyra Andrade Soler Martins I. A. M. "Effect of the deposition parameters on the electro optical properties and morphology of microcrystalline hydrogenated silicon alloys." Conference Record of the IEEE Photovoltaic Specialists Conference. Vol. 2. 1990. 1588-1590. Abstract

Microcrystalline phosphorus-doped hydrogenated silicon alloy films were deposited in a remote plasma CVD (chemical vapor deposition) system. The film properties were studied as a function of RF power density and hydrogen concentration in the reaction gas mixture. The properties of the deposited films are extremely sensitive to the RF power density in the studied range of 250 mW/cm2 to 625 mW/cm2. Very low values of electrical resistivity were obtained. For an RF power density of 500 mW/cm2, ρ = 3 × 10-2 Ω-cm, while ρ = 1.9 × 103 Ω-cm for 625 mW/cm2, indicating the predominance of the amorphous tissue over the microcrystalline phase. High doping efficiencies which can be correlated to large grain size are indicated by the very low values of the activation energy as low as 30 meV for 500 mW/cm2, that were obtained.

Águas, H., Raniero Pereira Fortunato Martins L. L. E. "Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon." Thin Solid Films. 451-452 (2004): 264-268. AbstractWebsite

This work presents a study performed on the deposition of pm-Si:H by plasma enhanced chemical vapor deposition using excitation frequencies of 13.56 and 27.12 MHz, where the interest of increasing the excitation frequency relies on higher plasma dissociation and reduced energy of ion bombardment, thus allowing the deposition of superior grade material at higher growth rates. The plasma impedance, which allows the monitoring of particle formation in the plasma, was correlated to the film properties, characterized by spectroscopic ellipsometry and hydrogen exodiffusion experiments. The set of data obtained show that by using the 27.12-MHz excitation frequency the hydrogen dilution and the r.f. power density needed to produce pm-Si:H can be reduced. Growth rates above 3.1 Å/s were obtained, the films being more dense and chemically more stable than those obtained with the standard 13.56 MHz. © 2003 Elsevier B.V. All rights reserved.