<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Martins, R., Maçarico, A., Ferreira, I., Fidalgo, J., Fortunato, E.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique</style></title><secondary-title><style face="normal" font="default" size="100%">Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">1997</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-0342478341&amp;partnerID=40&amp;md5=2ab85d8478085bcd75dc19791a2006d1</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">3</style></number><volume><style face="normal" font="default" size="100%">76</style></volume><pages><style face="normal" font="default" size="100%">259-272</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;The objective of this work is to present an analytical model able to interpret the experimental dependence of the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique on the deposition parameters (discharge pressure, gas flow temperature and rf power density). The model proposed is based on the Navier-Stokes equations applied to a gas flow considered to be quasi-incompressible and quasi-inviscous, whenever the Mach number is below 0·3. This condition leads to the establishment of the proper quasisteady-state gas flow equations, and the corresponding equations of energy and momentum balance ascribed to the mass profile of the species formed, under the presence of a low-rf-power plasma density, are able to predict the uniformity distribution of the film over the entire deposited substrate area.&lt;/p&gt;
</style></abstract><notes><style face="normal" font="default" size="100%">&lt;p&gt;cited By 6&lt;/p&gt;
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