<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Pereira, L., Barquinha, P., Fortunato, E., Martins, R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Electrical performances of low temperature annealed hafnium oxide deposited at room temperature</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Science Forum</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2006</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-37849002518&amp;partnerID=40&amp;md5=c0d96f385d091d9e38c143f68050a038</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">PART 1</style></number><volume><style face="normal" font="default" size="100%">514-516</style></volume><pages><style face="normal" font="default" size="100%">58-62</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;In this work, HfO2 was deposited by r.f. sputtering at room temperature and then annealed for different times at 200°C in a forming gas atmosphere. After annealing for 2 hours the HfO2 layers present a reduction on the flat band voltage of about 1 V, relatively to the as deposited film, decreasing from -2.23V down to -1.28 V. This means an improvement of the interface properties and a reduction on the oxide charge density from 1.33×1012 cm-2 to 7.62×1011 cm -2. The dielectric constant reaches a maximum of 18.3 after 5h annealing due to film's densification. When annealing for longer times such as 10h a small degradation of the electrical properties is observed. After 10h annealing the dielectric constant, flat band voltage and fixed charge density are respectively, 14.9, -2.96 V and 1.64×1012 cm-2 and the leakage current also increases due to film's crystallization.&lt;/p&gt;
</style></abstract><notes><style face="normal" font="default" size="100%">&lt;p&gt;cited By 1&lt;/p&gt;
</style></notes></record></records></xml>