@article {Martins1997249,
	title = {Structure, composition and electro-optical properties of n-type amorphous and microcrystalline silicon thin films},
	journal = {Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties},
	volume = {76},
	number = {3},
	year = {1997},
	note = {<p>cited By 5</p>
},
	pages = {249-258},
	abstract = {<p>This paper deals with the structure, composition and electro-optical characteristics of n-type amorphous and microcrystalline silicon thin films produced by plasma-enhanced chemical vapour deposition in a hydrogenhelium mixture. In addition, special emphasis is given to the role that hydrogen incorporation plays in the film{\textquoteright}s properties and in the characteristics of n-type microcrystalline films presenting simultaneously optical gaps of about 2{\textperiodcentered}3 eV (controlled by the hydrogen content in the film), a dark conductivity of 6-5S cm-1 and a Hall mobility of about 0{\textperiodcentered}86 cm2 V-1 s-1, the highest combined values for n-type microcrystalline silicon films, as far as we know.</p>
},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-5844325540\&partnerID=40\&md5=be5eed20e14af737b3c546b30d1787f5},
	author = {Martins, R., Ma{\c c}arico, A., Vieira, M., Ferreira, I., Fortunato, E.}
}
