@conference {Martins1997609,
	title = {Role of the gas flow parameters on the uniformity of films produced by PECVD technique},
	booktitle = {Materials Research Society Symposium - Proceedings},
	volume = {467},
	year = {1997},
	note = {<p>cited By 0</p>
},
	pages = {609-614},
	abstract = {<p>The aim of this work is to present an analytical model able to interpret the experimental data of the dependence of film{\textquoteright}s uniformity on the discharge pressure, gas flow and temperature used during the production of thin films by the plasma enhancement chemical vapour deposition technique, under optimised electrode{\textquoteright}s geometry and electric field distribution. To do so, the gas flow is considered to be quasi-incompressible and inviscous leading to the establishment of the electro-fluid-mechanics equations able to interpret the film{\textquoteright}s uniformity over the substrate area, when the discharge process takes place in the low power regime.</p>
},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-0031351337\&partnerID=40\&md5=59531f93f677b19b46db481bd5c769e0},
	author = {Martins, R., Macarico, A., Ferreira, I., Fortunato, E.}
}
