@conference {Ferreira2000,
	title = {Nanocrystalline undoped silicon films produce by hot wire plasma assisted technique},
	booktitle = {Materials Research Society Symposium - Proceedings},
	volume = {609},
	year = {2000},
	note = {<p>cited By 1</p>
},
	pages = {A2241-A2246},
	abstract = {<p>In this work, we show results concerning electro-optical properties, composition and morphology of nanocrystalline hydrogenated undoped silicon (nc-Si:H) films produced by hot wire plasma assisted chemical vapour deposition process (HWPA-CVD) and exhibiting a compact granular structure, as revealed by SEM micrographs. This was also inferred by infrared spectra, which does not present the SiO vibration band located at 1050-1200 cm-1, even when samples have long atmospheric exposition. The photoconductivity measured at room temperature also does not change when samples have a long time exposition to the air or to the light irradiation. The influence of hydrogen dilution on the properties of the films was also investigated.</p>
},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034429772\&partnerID=40\&md5=96c416c9ec3bc598b9f0c7c09573e221},
	author = {Ferreira, I.M.M., Martins, R.F.P., Cabrita, A.M.F., Fortunato, E.M.C., Vilarinho, P.}
}
