@article {Ferreira200160,
	title = {Mass spectroscopy analysis during the deposition of a-SiC:H and a-C:H films produced by hot wire and hot wire plasma-assisted techniques},
	journal = {Applied Surface Science},
	volume = {184},
	number = {1-4},
	year = {2001},
	note = {<p>cited By 6</p>
},
	pages = {60-65},
	abstract = {<p>This work analyse mainly the dissociation mechanism of the gas during the hot wire (HW) and hot wire plasma-assisted (HWPA) processes used to produce hydrogenated carbon films and silicon-carbide, using ethylene and silane as gas sources. The results show that ethylene is better decomposed by plasma-enhanced chemical vapour deposition (PECVD) than HW process. The data also show that the HWPA leads to a better carbon {\textcopyright} incorporation than HW processes, when silicon carbide alloys are produced and, that the presence of atomic hydrogen (H) is beneficial for all processes. That is, the presence of the plasma and H lead to the formation of higher C radicals such as methylsilane (CH3SiH3), ethylsilane (C2H5SiH3) and silorane (C2H4SiH2), whose contributions are enhanced as the fraction of ethylene (Feth) in the gas mixture increases. {\textcopyright} 2001 Published by Elsevier Science B.V.</p>
},
	doi = {10.1016/S0169-4332(01)00478-0},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-0035852208\&partnerID=40\&md5=5319cdeb173c3fef0cd7b9f65817e167},
	author = {Ferreira, I., Silva, V., �?guas, H., Fortunato, E., Martins, R.}
}
