@article {Martins2006238,
	title = {Performances of an in-line PECVD system used to produce amorphous and nanocrystalline silicon solar cells},
	journal = {Thin Solid Films},
	volume = {511-512},
	year = {2006},
	note = {<p>cited By 0</p>
},
	pages = {238-242},
	abstract = {<p>This paper presents the performances of an in-line plasma enhanced chemical vapor deposition system constituted by 5 chambers and one external unloaded chamber used in the simultaneous manufacturing of 4 large (30 cm {\texttimes} 40 cm) solar cells deposited on glass substrates. The system is fully automatically controlled by a Programmable Logic Controller using a specific developed software that allows devices mass production without losing the flexibility to perform process innovations according to the industrial requests, i.e. fast and secure changes and optimizations. Overall, the process shift is of about 15 min per each set of 4 solar cells. Without a buffer layer, solar cells with efficiencies of about 9\% were produced by the proper tuning of the i-layer production conditions. {\textcopyright} 2005 Elsevier B.V. All rights reserved.</p>
},
	doi = {10.1016/j.tsf.2005.12.001},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-33646818669\&partnerID=40\&md5=377180ac16ad2c296966d648df71be4d},
	author = {Martins, N.a , Canhola, P.a , Quintela, M.b , Ferreira, I.c , Raniero, L.c , Fortunato, E.c , Martins, R.b c c}
}
