@article {Golshahi2013103,
	title = {Effect of substrate temperature on the properties of pyrolytically deposited nitrogen-doped zinc oxide thin films},
	journal = {Materials Science and Engineering B: Solid-State Materials for Advanced Technology},
	volume = {178},
	number = {1},
	year = {2013},
	note = {<p>cited By 2</p>
},
	pages = {103-108},
	abstract = {<p>The effect of substrate temperature (Ts) on the properties of pyrolytically deposited nitrogen (N) doped zinc oxide (ZnO) thin films was investigated. The Ts was varied from 300 {\textdegree}C to 500 {\textdegree}C, with a step of 50 {\textdegree}C. The positive sign of Hall coefficient confirmed the p-type conductivity in the films deposited at 450 {\textdegree}C and 500 {\textdegree}C. X-ray diffraction studies confirmed the ZnO structure with a dominant peak from (1 0 0) crystal plane, irrespective of the variation in Ts. The presence of N in the ZnO structure was evidenced through X-ray photoelectron spectroscopy (XPS) analysis. The obtained high N concentration reveals that the 450 {\textdegree}C is the optimal Ts. Atomic force microscope (AFM) analysis showed that the surface roughness was increased with the increasing Ts until 400 {\textdegree}C but then decreased. It is found that the transmittance of the deposited films is increased with the increasing Ts. The optical band gap calculated from the absorption edge showed that the films deposited with T s of 300 {\textdegree}C and 350 {\textdegree}C possess higher values than those deposited at higher Ts. {\textcopyright} 2012 Elsevier B.V.</p>
},
	doi = {10.1016/j.mseb.2012.10.021},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-84870421478\&partnerID=40\&md5=7c8788582052842dfd83eb8d85ea56a9},
	author = {Golshahi, S.a , Rozati, S.M.b , Botelho Do Rego, A.M.c , Wang, J.d , Elangovan, E.e , Martins, R.e , Fortunato, E.e}
}
