@article {G-Berasategui2015256,
	title = {Corrosion resistance analysis of aluminium-doped zinc oxide layers deposited by pulsed magnetron sputtering},
	journal = {Thin Solid Films},
	volume = {594},
	year = {2015},
	note = {<p>cited By 1</p>
},
	pages = {256-260},
	abstract = {<p>In this paper an exhaustive analysis is performed on the electrochemical corrosion resistance of Al-doped ZnO (AZO) layers deposited on silicon wafers by a DC pulsed magnetron sputtering deposition technique to test layer durability. Pulse frequency of the sputtering source was varied and a detailed study of the electrochemical corrosion response of samples in the presence of a corrosive chloride media (NaCl 0.06 M) was carried out. Electrochemical impedance spectroscopy measurements were performed after reaching a stable value of the open circuit at 2 h, 192 h and 480 h intervals. Correlation of the corrosion resistance properties with the morphology, and the optical and electrical properties was tested. AZO layers with transmission values higher than 84\% and resistivity of 6.54 {\texttimes} 10- 4 {\^a}. cm for a deposition process pressure of 3 {\texttimes} 10- 1 Pa, a sputtering power of 2 kW, a pulse frequency of 100 kHz, with optimum corrosion resistance properties, were obtained. {\textcopyright} 2015 Elsevier B.V.</p>
},
	doi = {10.1016/j.tsf.2015.07.010},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-84947283156\&partnerID=40\&md5=d65ff087518bcd2d3189ea2ec2d7b62b},
	author = {G-Berasategui, E.a , Bay{\'o}n, R.a , Zubizarreta, C.a , Barriga, J.a , Barros, R.b , Martins, R.b , Fortunato, E.b}
}
