{\rtf1\ansi\deff0\deftab360

{\fonttbl
{\f0\fswiss\fcharset0 Arial}
{\f1\froman\fcharset0 Times New Roman}
{\f2\fswiss\fcharset0 Verdana}
{\f3\froman\fcharset2 Symbol}
}

{\colortbl;
\red0\green0\blue0;
}

{\info
{\author Biblio}{\operator }{\title Biblio RTF Export}}

\f1\fs24
\paperw11907\paperh16839
\pgncont\pgndec\pgnstarts1\pgnrestart
Bundaleski, N., J. Trigueiro, A. G. Silva, A. M. C. Moutinho, and O. M. N. D. Teodoro. "Influence of the patch field on work function measurements based on the secondary electron emission." \i JOURNAL OF APPLIED PHYSICS\i0 . 113.183720 (2013): 1-11.\par \par }