@article {Teodoro2007,
	title = {{Metal vapour source with real-time sub-monolayer control}},
	journal = {Vaccum},
	volume = {81},
	year = {2007},
	note = {<p>n/a</p>
},
	pages = {1529{\textendash}1531},
	abstract = {<p>To achieve highly accurate controlled depositions a specially designed vapour source, for metals with low to medium melting temperature, was developed. A quartz crystal microbalance is fitted inside the evaporation chamber to provide real-time rate and thickness monitoring. A carefully planned geometry allows maintaining a small deposition area centred on the sample without compromising flow rate measurements. Dosing rates as low as 0.02 ML/min are easily achieved, therefore providing true sub-monolayer control. This source was tested and calibrated for Ag and is being successfully used to study the growth of Ag clusters on TiO2.</p>
},
	keywords = {growth, metal deposition, vapour source},
	doi = {10.1016/j.vacuum.2007.04.029},
	author = {Teodoro, O M N D {\~A} and Moutinho, A M C and H. P. Marques and Cana, A R}
}
