Room-Temperature Cosputtered HfO2-Al2O3 Multicomponent Gate Dielectrics

Citation:
Pei, Z. L., L. Pereira, G. GONCALVES, P. Barquinha, N. Franco, E. Alves, A. M. B. Rego, R. Martins, and E. Fortunato. "Room-Temperature Cosputtered HfO2-Al2O3 Multicomponent Gate Dielectrics." Electrochemical and Solid State Letters. 12 (2009): G65-G68.

Abstract:

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Notes:

Times Cited: 11

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