%0 Journal Article %J Journal of Nanoscience and Nanotechnology %D 2010 %T Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition %A Águas, H. %A Filonovich, SA %A Bernacka-Wojcik, I %A Fortunato, E. %A Martins, R. %I American Scientific Publishers %N 4 %P 2547-2551 %V 10 %X n/a %Z n/a %@ 1533-4880