%0 Journal Article %J Applied surface science %D 2001 %T Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique %A Martins, R. %A Silva, V. %A Águas, H. %A Cabrita, A. %A Ferreira, I. %A Fortunato, E. %I Elsevier %N 1 %P 101-106 %V 184 %X n/a %Z n/a %@ 0169-4332