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\'c1guas, H., SA Filonovich, I. Bernacka-Wojcik, E. Fortunato, and R. Martins. "Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition." \i Journal of Nanoscience and Nanotechnology\i0 . 10.4 (2010): 2547-2551.\par \par }