Águas, H., SA Filonovich, I. Bernacka-Wojcik, E. Fortunato, and R. Martins. "Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition." Journal of Nanoscience and Nanotechnology. 10.4 (2010): 2547-2551.