{\rtf1\ansi\deff0\deftab360

{\fonttbl
{\f0\fswiss\fcharset0 Arial}
{\f1\froman\fcharset0 Times New Roman}
{\f2\fswiss\fcharset0 Verdana}
{\f3\froman\fcharset2 Symbol}
}

{\colortbl;
\red0\green0\blue0;
}

{\info
{\author Biblio}{\operator }{\title Biblio RTF Export}}

\f1\fs24
\paperw11907\paperh16839
\pgncont\pgndec\pgnstarts1\pgnrestart
Lopes, M. E., H. L. Gomes, M. C. R. Medeiros, P. Barquinha, L. Pereira, E. Fortunato, R. Martins, and I. Ferreira. "Gate-bias stress in amorphous oxide semiconductors thin-film transistors." \i Applied Physics Letters\i0 . 95.6 (2009): 063502-3.\par \par }