@article {5639,
	title = {Highly conductive p-type nanocrystalline silicon films deposited by RF-PECVD using silane and trimethylboron mixtures at high pressure},
	journal = {Vacuum},
	volume = {83},
	year = {2009},
	note = {n/a},
	pages = {1253-1256},
	publisher = {Pergamon},
	abstract = {n/a},
	isbn = {0042-207X},
	author = {Filonovich, SA and Aguas, H. and Bernacka-Wojcik, I and Gaspar, C and Vilarigues, M and Silva, LB and Fortunato, E. and Martins, R.}
}
