Publications

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Journal Article
Ferreira, I., P. Vilarinho, F. FERNANDES, E. Fortunato, and R. Martins. "6 Optoelectronics-Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique." Key Engineering Materials. 230 (2002): 591-594. Abstract
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Chumakov, Yu, S. - Y. Xiong, JR Santos, I. Ferreira, K. Termentzidis, A. Pokropivny, P. Cortona, and S. Volz. "Ab Initio Calculations and Measurements of Thermoelectric Properties of V2O5 Films." Journal of Electronic Materials (2012): 1-7. Abstract
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Martins, R., M. Vieira, E. Fortunato, I. Ferreira, F. Soares, and L. Guimarāes. "DETERMINATION OF a-Si: H FILMS QUALITY THROUGH FST AND SCLC TECHNIQUES." Amorphous Silicon Technology-1990. 192 (1990): 169. Abstract
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Aguas, H., L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, and R. Martins. "Effect of an interfacial oxide layer in the annealing behaviour of Au/a-Si: H MIS photodiodes." Journal of non-crystalline solids. 338 (2004): 810-813. Abstract
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Pereira, LuÍs, Isabel Ferreira, Rodrigo Martins, Paula M. Vilarinho, Hugo Águas, Elvira Fortunato, A. R. Ramos, A. S. Viana, and J. Andreu. "Effect of annealing on gold rectifying contacts in amorphous silicon." Materials Science Forum. 455 (2004): 96-99. Abstract
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Lavado, M., R. Martins, I. Ferreira, G. Lavareda, E. Fortunato, M. Vieira, and L. Guimarães. "Electron paramagnetic resonance of defects in doped microcrystalline silicon." Vacuum. 39.7 (1989): 791-794. Abstract
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Fortunato, E., V. Assuncao, A. Goncalves, A. Marques, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. "High quality conductive gallium-doped zinc oxide films deposited at room temperature." Thin Solid Films. 451 (2004): 443-447. Abstract
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Filonovich, SA, H. Aguas, I. Bernacka-Wojcik, C. Gaspar, M. Vilarigues, LB Silva, E. Fortunato, and R. Martins. "Highly conductive p-type nanocrystalline silicon films deposited by RF-PECVD using silane and trimethylboron mixtures at high pressure." Vacuum. 83.10 (2009): 1253-1256. Abstract
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Ferreira, I., E. Fortunato, R. Martins, and P. Vilarinho. "Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films." Journal of applied physics. 91.3 (2002): 1644-1649. Abstract
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Filonovich, Sergej Alexandrovich, Hugo Águas, Tito Busani, António Vicente, Andreia Araújo, Diana Gaspar, Marcia Vilarigues, Joaquim Leitão, Elvira Fortunato, and Rodrigo Martins. "Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B (CH3) 3." Science and Technology of Advanced Materials. 13.4 (2012): 045004. Abstract
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Ferreira, I., E. Fortunato, P. Vilarinho, A. S. Viana, A. R. Ramos, E. Alves, and R. Martins. "Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques." Journal of non-crystalline solids. 352.9 (2006): 1361-1366. Abstract
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Braz Fernandes, Francisco Manuel, Isabel Ferreira, Rodrigo Martins, Paula M. Vilarinho, and Elvira Fortunato. "Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique." Key Engineering Materials. 230 (2002): 591-594. Abstract
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Gaspar, D., AC Pimentel, T. Mateus, JP Leitão, J. Soares, BP Falcão, A. Araújo, A. Vicente, SA Filonovich, and H. Aguas. "Influence of the layer thickness in plasmonic gold nanoparticles produced by thermal evaporation." Scientific reports. 3 (2013). Abstract
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Kholkin, AL, R. Martins, H. Aguas, I. Ferreira, V. Silva, OA Smirnova, M. E. V. Costa, P. M. Vilarinho, E. Fortunato, and JL Baptista. "Metal-ferroelectric thin film devices." Journal of non-crystalline solids. 299 (2002): 1311-1315. Abstract
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Ferreira, I., Braz F. Fernandes, P. Vilarinho, E. Fortunato, and R. Martins. "Nanocrystalline p-type silicon films produced by hot wire plasma assisted technique." Materials Science and Engineering: C. 15.1 (2001): 137-140. Abstract
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Ferreira, Isabel M. M., Rodrigo F. P. Martins, Ana MF Cabrita, Elvira M. C. Fortunato, and Paula Vilarinho. "Nanocrystalline Undoped Silicon Films Produced By Hot Wire Plasma Assisted Technique." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 609 (2001): A22. 4-A22. 4. Abstract
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Fortunato, E., A. Gonçalves, A. Marques, A. Viana, H. Águas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. "New developments in gallium doped zinc oxide deposited on polymeric substrates by RF magnetron sputtering." Surface and Coatings Technology. 180 (2004): 20-25. Abstract
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Prabakaran, R., T. Monteiro, M. Peres, A. S. Viana, AF Da Cunha, H. Águas, A. Gonçalves, E. Fortunato, R. Martins, and I. Ferreira. "Optical and structural analysis of porous silicon coated with GZO films using rf magnetron sputtering." Thin Solid Films. 515.24 (2007): 8664-8669. Abstract
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Raniero, L., A. Goncalves, A. Pimentel, S. Zhang, I. Ferreira, P. M. Vilarinho, E. Fortunato, and R. Martins. "PART 1-I-Electronic, Magnetic and Photonic Materials-Role of Hydrogen Plasma on the Electrical and Optical Properties of Indium Zinc Transparent Conductive Oxide." Materials Science Forum. 514516 (2006): 63-67. Abstract
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Zhang, S., Z. Hu, L. Raniero, X. Liao, I. Ferreira, E. Fortunato, P. M. Vilarinho, L. Pereira, and R. Martins. "PART 1-I-Electronic, Magnetic and Photonic Materials-The Study of High Temperature Annealing of a-SiC: H Films." Materials Science Forum. 514516 (2006): 18-22. Abstract
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Vieira, M., A. Maçarico, R. Martins, I. Ferreira, and L. Guimarāes. "Plasma Diagnostic of a TCDDC System Using a Quadropole Mass Spectrometer." MRS Proceedings. 149.1 (1989). Abstract
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Ferreira, I., Braz F. Fernandes, P. Vilarinho, E. Fortunato, and R. Martins. "Properties of Nanocrystalline n-Type Silicon Films Produced by Hot Wire Plasma Assisted Technique." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 664 (2001): A7. 6-A7. 6. Abstract
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Ferreira, Isabel, Rodrigo Martins, Paula M. Vilarinho, Elvira Fortunato, Ana Pimentel, Alexandra Gonçalves, Leandro Raniero, and Shibin Zhang. "Role of hydrogen plasma on the electrical and optical properties of indium zinc transparent conductive oxide." Materials science forum. 514 (2006): 63-67. Abstract
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Martins, R., M. Vieira, I. Ferreira, and E. Fortunato. "Role of oxygen partial pressure on the properties of doped silicon oxycarbide microcrystalline layers produced by spatial separation techniques." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13.4 (1995): 2199-2209. Abstract
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Martins, R., I. Ferreira, E. Fortunato, and M. Vieira. "Silicon Oxycarbide Microcrystalline Layers Produced by Spatial Separation Techniques." MRS Proceedings. 336.1 (1994). Abstract
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