Publications

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Águas, H., SA Filonovich, I. Bernacka-Wojcik, E. Fortunato, and R. Martins. "Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition." Journal of Nanoscience and Nanotechnology. 10.4 (2010): 2547-2551. Abstract
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Águas, Hugo, Sanjay K. Ram, Andreia Araújo, Diana Gaspar, António Vicente, Sergej A. Filonovich, Elvira Fortunato, Rodrigo Martins, and Isabel Ferreira. "Silicon thin film solar cells on commercial tiles." Energy & Environmental Science. 4.11 (2011): 4620-4632. Abstract
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Aguas, H., L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, and R. Martins. "Effect of an interfacial oxide layer in the annealing behaviour of Au/a-Si: H MIS photodiodes." Journal of non-crystalline solids. 338 (2004): 810-813. Abstract
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Aguas, H., V. Silva, E. Fortunato, S. Lebib, P. Roca i Cabarrocas, I. Ferreira, L. Guimaraes, and R. Martins. "Large area deposition of polymorphous silicon by plasma enhanced chemical vapor deposition at 27.12 MHz and 13.56 MHz." Japanese journal of applied physics. 42 (2003): 4935. Abstract
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Aguas, Hugo, Isabel Ferreira, Rodrigo Martins, Elvira Fortunato, R. Prabakaran, LuÍs Pereira, and E. Elangovan. "Optical and Microstructural Investigations of Porous Silicon Coated with a-Si: H Using PECVD Technique." Materials Science Forum. 587 (2008): 308-312. Abstract
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Aguas, H., V. Silva, I. Ferreira, E. Fortunato, and R. Martins. "Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films." Philosophical Magazine B. 80.4 (2000): 475-486. Abstract
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Alvarez, F., J. Andreu, H. Branz, JP Conde, R. Collins, R. Dusane, J. Jang, M. Kondo, S. C. Lee, and C. Longeaud. "List of Committees." (Submitted). Abstract
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Assuncao, V., E. Fortunato, A. Marques, H. Aguas, I. Ferreira, M. E. V. Costa, and R. Martins. "Influence of the deposition pressure on the properties of transparent and conductive ZnO: Ga thin-film produced by rf sputtering at room temperature." Thin Solid Films. 427.1 (2003): 401-405. Abstract
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Assunção, Vitor, Elvira Fortunato, António Marques, Alexandra Gonçalves, Isabel Ferreira, Hugo Águas, and Rodrigo Martins. "New challenges on gallium-doped zinc oxide films prepared by rf magnetron sputtering." Thin Solid Films. 442.1 (2003): 102-106. Abstract
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