Publications

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Journal Article
Kholkin, AL, R. Martins, H. Aguas, I. Ferreira, V. Silva, OA Smirnova, M. E. V. Costa, P. M. Vilarinho, E. Fortunato, and JL Baptista. "Metal-ferroelectric thin film devices." Journal of non-crystalline solids. 299 (2002): 1311-1315. Abstract
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Pereira, LuÍs, António Marques, Isabel Ferreira, Rodrigo Martins, Hugo Águas, Pedro Barquinha, Elvira Fortunato, Ana Pimentel, Alexandra Gonçalves, and Leandro Raniero. "Multifunctional thin film zinc oxide semiconductors: Application to electronic devices." Materials science forum. 514 (2006): 3-7. Abstract
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Prabakaran, R., H. Aguas, E. Fortunato, R. Martins, and I. Ferreira. "n-PS/a-Si: H heterojunction for device application." Journal of Non-Crystalline Solids. 354.19 (2008): 2632-2636. Abstract
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Martins, R., Leandro Raniero, Luis Pereira, Daniel Costa†, Hugo Aguas, Sonia Pereira, Leonardo Silva, A. Gonçalves, I. Ferreira, and E. Fortunato. "Nanostructured silicon and its application to solar cells, position sensors and thin film transistors." Philosophical Magazine. 89.28-30 (2009): 2699-2721. Abstract
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Martins, R., H. Aguas, V. Silva, I. Ferreira, A. Cabrita, and E. Fortunato. "Nanostructured silicon films produced by PECVD." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 664 (2001): A9. 6-A9. 6. Abstract
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Assunção, Vitor, Elvira Fortunato, António Marques, Alexandra Gonçalves, Isabel Ferreira, Hugo Águas, and Rodrigo Martins. "New challenges on gallium-doped zinc oxide films prepared by rf magnetron sputtering." Thin Solid Films. 442.1 (2003): 102-106. Abstract
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Fortunato, E., A. Gonçalves, A. Marques, A. Viana, H. Águas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. "New developments in gallium doped zinc oxide deposited on polymeric substrates by RF magnetron sputtering." Surface and Coatings Technology. 180 (2004): 20-25. Abstract
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Brida, D., E. Fortunato, H. Aguas, V. Silva, A. Marques, L. Pereira, I. Ferreira, and R. Martins. "New insights on large area flexible position sensitive detectors." Journal of non-crystalline solids. 299 (2002): 1272-1276. Abstract
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Martins, R., H. Aguas, A. Cabrita, P. Tonello, V. Silva, I. Ferreira, E. Fortunato, and L. Guimaraes. "New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions." Solar energy. 69 (2001): 263-269. Abstract
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Martins, Rodrigo, Isabel Ferreira, Ana Cabrita, Hugo Águas, Vitor Silva, and Elvira Fortunato. "New Steps to Improve a‐Si: H Device Stability by Design of the Interfaces." Advanced Engineering Materials. 3.3 (2001): 170-173. Abstract
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Aguas, Hugo, Isabel Ferreira, Rodrigo Martins, Elvira Fortunato, R. Prabakaran, LuÍs Pereira, and E. Elangovan. "Optical and Microstructural Investigations of Porous Silicon Coated with a-Si: H Using PECVD Technique." Materials Science Forum. 587 (2008): 308-312. Abstract
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Prabakaran, R., T. Monteiro, M. Peres, A. S. Viana, AF Da Cunha, H. Águas, A. Gonçalves, E. Fortunato, R. Martins, and I. Ferreira. "Optical and structural analysis of porous silicon coated with GZO films using rf magnetron sputtering." Thin Solid Films. 515.24 (2007): 8664-8669. Abstract
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Martins, R., D. Costa, H. Aguas, F. Soares, A. Marques, I. Ferreira, PMR Borges, S. Pereira, L. Raniero, and E. Fortunato. "PART 1-I-Electronic, Magnetic and Photonic Materials-Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors." Materials Science Forum. 514516 (2006): 13-17. Abstract
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Fortunato, E., A. Gonc@ 4alves, A. Marques, A. Pimentel, P. Barquinha, H. Aguas, L. Pereira, L. Raniero, G. GONCALVES, and I. Ferreira. "PART 1-I-Electronic, Magnetic and Photonic Materials-Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices." Materials Science Forum. 514516 (2006): 3-7. Abstract
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Ferreira, I., H. Aguas, L. Mendes, F. FERNANDES, E. Fortunato, and R. Martins. "Performances of Nano/Amorphous Silicon Films Produced by Hot Wire Plasma Assisted Technique." MRS Proceedings. 507.1 (1998). Abstract
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Pimentel, A., E. Fortunato, A. Gonçalves, A. Marques, H. Águas, L. Pereira, I. Ferreira, and R. Martins. "Polycrystalline intrinsic zinc oxide to be used in transparent electronic devices." Thin Solid Films. 487.1 (2005): 212-215. Abstract
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Martins, Rodrigo, Hugo Águas, Isabel Ferreira, Elvira Fortunato, Sarra Lebib, P. Roca i Cabarrocas, and Leopoldo Guimarães. "Polymorphous silicon films deposited at 27.12 MHz." Chemical Vapor Deposition. 9.6 (2003): 333-337. Abstract
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Fortunato, E., D. Brida, I. Ferreira, H. Águas, P. Nunes, and R. Martins. "Production and characterization of large area flexible thin film position sensitive detectors." Thin Solid Films. 383.1 (2001): 310-313. Abstract
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Ferreira, Isabel, Hugo Águas, Luı́s Pereira, Elvira Fortunato, and Rodrigo Martins. "Properties of a-Si: H intrinsic films produced by HWPA-CVD technique." Thin solid films. 451 (2004): 366-369. Abstract
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Martins, Rodrigo F. P., Arman Ahnood, Nuno Correia, Luís MNP Pereira, Raquel Barros, Pedro MCB Barquinha, Ricardo Costa, Isabel M. M. Ferreira, Arokia Nathan, and Elvira EMC Fortunato. "Recyclable, Flexible, Low‐Power Oxide Electronics." Advanced Functional Materials (2012). Abstract
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Raniero, L., S. Zhang, H. Aguas, I. Ferreira, R. Igreja, E. Fortunato, and R. Martins. "Role of buffer layer on the performances of amorphous silicon solar cells with incorporated nanoparticles produced by plasma enhanced chemical vapor deposition at 27.12 MHz." Thin Solid Films. 487.1 (2005): 170-173. Abstract
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Martins, R., H. Aguas, I. Ferreira, V. Silva, A. Cabrita, and E. Fortunato. "Role of ion bombardment and plasma impedance on the performances presented by undoped a-Si: H films." Thin solid films. 383.1 (2001): 165-168. Abstract
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Ferreira, Isabel, Hugo Águas, Luı́s Mendes, and Rodrigo Martins. "Role of the hot wire filament temperature on the structure and morphology of the nanocrystalline silicon p-doped films." Applied surface science. 144 (1999): 690-696. Abstract
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Águas, H., SA Filonovich, I. Bernacka-Wojcik, E. Fortunato, and R. Martins. "Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition." Journal of Nanoscience and Nanotechnology. 10.4 (2010): 2547-2551. Abstract
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Ferreira, Isabel, Rodrigo Martins, A. Cabrita, Hugo Águas, V. Silva, and Elvira Fortunato. "Silicon Films Produced by PECVD Under Powder Formation Conditions." Materials Science Forum. 382 (2001): 21-30. Abstract
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