@article { ISI:000273984900066,
	title = {Undoped InOx Films Deposited by Radio Frequency Plasma Enhanced Reactive Thermal Evaporation at Room Temperature: Importance of Substrate},
	journal = {JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY},
	volume = {10},
	number = {4},
	year = {2010},
	note = {<p>2nd International Conference on Advanced Nano Materials, Univ Aveiro, Aveiro, PORTUGAL, 2008</p>
},
	month = {APR},
	pages = {2701-2704},
	abstract = {<p>Conductive and transparent undoped thin films of indium oxide (InOx), 120 nm average thick, were deposited by radio frequency plasma enhanced reactive thermal evaporation (rf-PERTE) of indium in the presence of oxygen at room temperature. Several substrates were used in order to study their influence on the main properties of these films: alkali free (AF) glass, fused silica, crystalline silicon and polyethylene terephthalate (PET). Surface morphology of the InOx films as a function of the substrates was observed by SEM and showed that the undoped InOx films obtained are nano-structured. For the c-Si substrate, InOx films with increased grain size are obtained, induced by the crystalline substrate. Films deposited on fused silica and AF glass substrates show a nano-grainy surface with similar surface morphologies. The InOx films deposited on AF glass show the highest values of both: electrical conductivity of about 1100 (Omega cm)(-1) and visible transmittance of 85\%. The substrate has a greater influence on the surface morphology of the films when a polymer (PET) is used. InOx films deposited on PET show a decrease in the electrical conductivity (90 (Omega cm)(-1)) and a slight decrease in the average visible transmittance (78\%).</p>
},
	issn = {1533-4880},
	doi = {10.1166/jnn.2010.1431},
	author = {Parreira, P. and Lavareda, G and Valente, J. and Nunes, F. T. and Amaral, A. and de Carvalho, C. Nunes}
}
