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Ribeiro, Celso, Pedro Brogueira, Guilherme Lavareda, Carlos N. Carvalho, Ana Amaral, Luis Santos, Jorge Morgado, Ulrich Scherf, and Vasco D. B. Bonifacio. "Ultrasensitive microchip sensor based on boron-containing polyfluorene nanofilms." BIOSENSORS & BIOELECTRONICS 26 (2010): 1662-1665. Abstract

A fluorene-based pi-conjugated copolymer with on-chain dibenzoborole units was used in the development of a nanocoated gold interdigitated microelectrode array device which successfully detects fluoride in a broad range of concentrations (10(-11)-10(-4) M) in aqueous solution, upon impedance spectroscopy measurements. A calibration curve obtained over this range of concentrations and a new analytical method based on impedance spectroscopy measurements in aqueous solution is proposed. The sensor nanofilm was produced by spin-coating and diagnosed via spectroscopic ellipsometry, AFM, and electrically conductivity techniques. Changes in the conductivity due to the boron-fluoride complex formation seem to be the major mechanism behind the dependence of impedimetric results on the fluoride concentration. (C) 2010 Elsevier B.V. All rights reserved.

Ricardo, L., A. Amaral, Nunes C. de Carvalho, and G. Lavareda. "Dopant transfer from poly-si thin films to c-Si: An alternative technique for device processing." Materials Science in Semiconductor Processing 42 (2016): 210-214. Abstract

An alternative technique for production of devices which uses both silicon crystalline wafers (p-type) and heavy doped amorphous silicon thin films (n-type) is reported. The amorphous silicon acts as a finite source of dopant and is deposited (at low temperature, 70 °C) by plasma enhanced chemical vapor deposition on silicon wafers. Afterwards, the process of dopant diffusion into the crystalline silicon occurs in a diffusion furnace at 1000 °C for 2 h, to create p–n junctions. Using SIMS analyses, a dopant (P) transfer into c-Si of about 30% is verified and 87% of the dopant transferred is electrically active. Consequently, n-MOSFET devices are produced using a gate oxide thermally grown at the same diffusion temperature for one hour. The preliminary results of the MOSFET (channel length and width of 0.5 and 5 mm, respectively) show a depletion behavior with a threshold voltage, Vth=−8.2 V and afield-effect mobility, µFE=187.8 cm2/(Vs).