<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Parreira, P.</style></author><author><style face="normal" font="default" size="100%">Lavareda, G</style></author><author><style face="normal" font="default" size="100%">Valente, J.</style></author><author><style face="normal" font="default" size="100%">Nunes, F. T.</style></author><author><style face="normal" font="default" size="100%">Amaral, A.</style></author><author><style face="normal" font="default" size="100%">Nunes de Carvalho, C</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Undoped InOx Films Deposited by Radio Frequency Plasma Enhanced Reactive Thermal Evaporation at Room Temperature: Importance of Substrate</style></title><secondary-title><style face="normal" font="default" size="100%">JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2010</style></year><pub-dates><date><style  face="normal" font="default" size="100%">APR</style></date></pub-dates></dates><volume><style face="normal" font="default" size="100%">10</style></volume><pages><style face="normal" font="default" size="100%">2701-2704</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Conductive and transparent undoped thin films of indium oxide (InOx), 120 nm average thick, were deposited by radio frequency plasma enhanced reactive thermal evaporation (rf-PERTE) of indium in the presence of oxygen at room temperature. Several substrates were used in order to study their influence on the main properties of these films: alkali free (AF) glass, fused silica, crystalline silicon and polyethylene terephthalate (PET). Surface morphology of the InOx films as a function of the substrates was observed by SEM and showed that the undoped InOx films obtained are nano-structured. For the c-Si substrate, InOx films with increased grain size are obtained, induced by the crystalline substrate. Films deposited on fused silica and AF glass substrates show a nano-grainy surface with similar surface morphologies. The InOx films deposited on AF glass show the highest values of both: electrical conductivity of about 1100 (Omega cm)(-1) and visible transmittance of 85%. The substrate has a greater influence on the surface morphology of the films when a polymer (PET) is used. InOx films deposited on PET show a decrease in the electrical conductivity (90 (Omega cm)(-1)) and a slight decrease in the average visible transmittance (78%).&lt;/p&gt;
</style></abstract><notes><style face="normal" font="default" size="100%">&lt;p&gt;2nd International Conference on Advanced Nano Materials, Univ Aveiro, Aveiro, PORTUGAL, 2008&lt;/p&gt;
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