Sputtering preparation of silicon nitride thin films for gate dielectric applications

Citation:
Pereira, L., H. Aguas, R. Igreja, R. M. S. Martins, N. Nedev, L. Raniero, E. Fortunato, and R. Martins. "Sputtering preparation of silicon nitride thin films for gate dielectric applications." Advanced Materials Forum Ii. Eds. R. Martins, E. Fortunato, I. Ferreira, and C. Dias. Vol. 455-456. Materials Science Forum, 455-456. 2004. 69-72.

Abstract:

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Notes:

Times Cited: 0 Pereira, L Aguas, H Igreja, R Martins, RMS Nedev, N Raniero, L Fortunato, E Martins, R 2nd International Materials Symposium APR 14-16, 2003 Caparica, PORTUGAL